In-situ Microscopic Imaging CVD System

• Resistance up to 950 ℃, Resolution of 1 μm.
• High-Temperature Process Research: 2D Material Growth, Thin File Deposition, High-Temperature Crystallization, High-Temperature Etching.
• Customizable: Raman Spectroscopy, SHG Imaging

Automatic Optical Inspection System

• BF / DF Imaging. Fast image processing algorithm.
• Detectable defects: Particls, Scratches, Holes.
• Customizable: Fluorescence Spectrum, Raman Spectrum, SHG Spectroscopy.

Monolayer MoS₂ Wafer

• Domain Size (> 50 μm).
• Coverage & Monolayer Percent: > 99 %
• Wafer size: 1cm to 4 inches

Modularized Educational Spectroscopic System

• Modularized design.
• Free assembly: Raman Spectroscopy, Atomic Emission Spectroscopy, Fluorescence Spectroscopy.
• Rich teaching resources.